Dr Ian Johnston earned his BEng in Electronics and his Ph.D. in Microelectronics at the University of Southampton in England. He was employed by Surface Technology Systems as a Process Engineer where he specialized in deep reactive ion etching (DRIE) of silicon. He then led the R&D group at STS, developing plasma sources at non-standard frequencies and processes for high aspect ratio trench etching of GaAs.
In 2003 he joined Innovative Micro Technology in Santa Barbara, CA. to oversee the development of dry etch processes before taking on the role of Product Manager. In this position he managed over twenty projects in diverse applications such as RF switches and phase shifters, mirror arrays for opto-telecommunications and ocular drug delivery systems. He has also consulted with a number of start-up MEMS companies on processing techniques and plasma etching.